1. Materials and Physical Properties of High-k Oxides, Ran Liu, Materials Fundamentals of Gate Dielectrics, Ed. by A.A. Demkov and A. Navrotsky (eds.),
2. Raman Characterization of Si/Si1-xGex Heterostructures, Ran Liu, SiGeC Alloys: Growth, Properties, and Devices, Ed. By S.T. Pantelides and S. Zollner, Taylor & Francis Books, Inc.
微纳系统中心
职称：教授、博导
职务：学院学术委员会委员、学院教授委员会成员
电子邮件：[email protected]
办公地点：科学楼422办公室
电话：55664548
课题组主页：//me.gongkou-labs.com/faculty/personweb/liuran/index.htm
